Formation of Submicron Patterns on Films

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Intellectual Property

ID:		UMA 00-05
IP Type:		Licensable Technology
Title:		Formation of Submicron Patterns on Films
Inventor:		Tom Russell, Thomas Thurn-Albrecht, Erik Schaffer, Jurgen Mlynek, and Ullrich Steiner
Summary:		This invention offers a novel but easily adapted approach to well defined and well organized hollow structures in polymers. Extremely dense submicron lithographic patterns in films have numerous applications in Microelectronics and data storage, medical and research biotechnologies, high-tech materials for insulators and adhesives. More generally, this invention is suitable for applications requiring well-defined submicron features.
Tech Type:		Materials and Materials Diagnostics \| Nanotechnology/NEMS \| Materials and Materials Diagnostics
URL:		http://amherst.cvip-umass.net/index.cfm?fuseaction=tech.index
Contact:		Office of Commercial Ventures and Intellectual Property Phone: 413-545-3606 FAX: 413-545-3632 E-Mail: cvip@research.umass.edu
Organization:		University of Massachusetts at Amherst

Display all intellectual properties for Tom Russell, Thomas Thurn-Albrecht, Erik Schaffer, Jurgen Mlynek, and Ullrich Steiner
Display all intellectual properties for University of Massachusetts at Amherst