Novel and improved method of Quantum Ellipsometry for measuring the thickness of thin films

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Intellectual Property

ID:		00-69
IP Type:		Licensable Technology
Title:		Novel and improved method of Quantum Ellipsometry for measuring the thickness of thin films
Inventor:		Teich, Malvin C.
Summary:		Classical ellipsometry is a method of measuring the thickness of thin films, which requires the characterization of the polarization properties of the sample, the use of precisely calibrated photodetectors and having a reference sample. Quantum ellipsometry can obtain an absolute measurement without the use of a reference sample and precisely calibrated photodetectors. Ellipsometers are commonly used in semiconductor fabrication facilities where it is necessary to analyze the thin films that are layered onto silicon wafers in order to produce semiconductor chips. Because quantum ellipsometry eliminates the need for a reference sample and precisely calibrated photodetectors, it offers a competitive advantage over classical ellipsometry, and can replace existing ellipsometry technologies.
Tech Type:		Materials Diagnostics
URL:		http://ctf-fmfe.bu.edu/NoPDF.htm
Contact:		Sean Lee, seanlee@bu.edu, 617 353 4567
Organization:		Boston University

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